A group of scientists from Hanyang University has published a report reviewing and discussing the outlook of atomic layer deposition (ALD) based oxide semiconductor thin film transistors (TFTs). The ...

A new technical paper titled “Large-area synthesis of high electrical performance MoS 2 by a commercially scalable atomic layer deposition process” by researchers at the University of Southampton, LMU ...

DENVER, Feb. 05, 2026 (GLOBE NEWSWIRE) -- Forge Nano, Inc., a technology company pioneering domestic battery and semiconductor innovations, today announced a breakthrough that fundamentally redefines ...

BLOOMINGTON, Minn.--(BUSINESS WIRE)--SkyWater Technology (NASDAQ: SKYT), the trusted technology realization partner, today announced it will offer customers a new semiconductor processing tool for ...

Solid oxide fuel cells (SOFC) are widely used for energy storage, transportation, and various applications, employing solid electrolytes such as ceramics. The efficiency of these cells relies on the ...

Forge Nano, Inc., a leading ALD equipment provider and materials science company, today further expanded into the semiconductor market with the unveiling of its new Atomic Layer Deposition (ALD) ...

BILTHOVEN, THE NETHERLANDS, December 11, 2008 – Further extending its leadership in the critical atomic layer deposition (ALD) market, ASM International N.V. (NASDAQ: ASMI and Euronext Amsterdam: ASM) ...

At Thermic Edge, we’re proud to introduce our new Atomic Layer Deposition (ALD) System, designed to accelerate the integration of 2D materials into next-generation semiconductor devices, including ...

AlixLabs, a Swedish pioneer in Atomic Layer Etching (ALE) technology for next-generation semiconductor manufacturing, has ...

Breakthrough turbulent flow technology eliminates semiconductor manufacturing's most stubborn bottleneck, enabling high-speed production of next-generation AI chips and 3D architectures DENVER, Feb.